LFGS – Plasma Power Generators – RF Plasma Generators

The versatile, variable-frequency LFGS generator (1250 W, 40 to 500 kHz) suits a wide variety of semiconductor and general plasma-processing applications, including sputtering, reactive ion etching, plasma deposition, polymerization, and surface treatment. Its compact 19′, rack-mountable, air-cooled package eases installation and saves valuable space. With a half-bridge, class-D amplifier design, the LFGS power supply enables the lowest reflected power commercially available.

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